Semiconductor manufacturing — US PTAB Patent Cases
41 decisions indexed
Page 2 of 2 · 41 total
Samsung Electronics Co., Ltd. et al. v.Harbor Island Dynamic, LLC
The PTAB found all twenty challenged claims unpatentable in this IPR proceeding concerning backside metal adhesion. The Board adopted the Patent Owner's position that the claim language does not require strict direct contact for 'on a bottom surface.'
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung submits an authorized response to the Patent Owner’s Director Review request, defending the Board’s findings that the ’802 patent’s claims are valid and that prior art references, including Sung’146, are properly considered. The petitioner seeks denial of the review.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung seeks to invalidate a CMP‑pad dresser patent (U.S. 9,138,862) by alleging that prior‑art references, especially Sung’026 and related disclosures, anticipate or render obvious all 20 claims. The petition argues public accessibility of the prior art and cites discretionary factors favoring institution.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung’s IPR against Chien‑Min Sung’s 9,724,802 patent was decided with claims 1‑9 and 12‑21 found unpatentable. The patent owner now petitions the Director to overturn the Board’s findings, arguing errors in the designated‑profile analysis, ignored expert testimony, and improper priority treatment of Sung ’146.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung Austin Semiconductor challenges the validity of Sung's patent (9138862) in a Petition, asserting that various prior art references anticipate or render obvious the claimed CMP pad dresser technology. The arguments center on how Sung’026 and combinations with other references teach all limitations of the claims regarding particle arrangement and cutting depths.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung Austin Semiconductor challenges the '802 Patent covering Chemical Mechanical Planarization (CMP) pad dressing technology. The Petitioner argues that prior art references, including Tsai et al., anticipate or render obvious all 21 claimed claims. This is a foundational challenge to the patent's validity in semiconductor manufacturing.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
Samsung Austin Semiconductor challenges the validity of Sung's '270 Patent before the PTAB, asserting that claims related to CMP pad conditioning are obvious. The petition relies heavily on combinations of prior art references (Chou and Sung’479) to demonstrate non-obviousness under 35 U.S.C. § 103.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
The PTAB granted institution for all 21 claims in this IPR, finding sufficient evidence of record that prior art (Tsai, Sung '026, Sung '146) anticipates or renders obvious the claimed technology. The decision was reached despite concerns regarding parallel district court litigation involving Samsung and other entities.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
The PTAB issued a Final Written Decision finding that most claims (1-9 and 12-21) of the '802 patent were unpatentable over prior art references, primarily Tsai. The Board relied heavily on anticipation and obviousness grounds, while also addressing written description challenges to specific claim limitations.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
The PTAB found all 20 claims of U.S. Patent No. 9138862 unpatentable by anticipation or obviousness over Sung ’026. The technology relates to Chemical Mechanical Polishing (CMP) pad conditioning methods, and the Board concluded that Petitioner successfully established invalidity across all grounds presented.
Samsung Austin Semiconductor, LLC et al. v.Sung, Chien-Min
The PTAB issued a Final Written Decision finding all eight challenged claims unpatentable based on obviousness. The Board accepted the Petitioner's argument that combining Chou and Sung ’479 provided sufficient motivation to achieve the claimed narrow variation in CMP technology.
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